ALEXANDRIA, Va., June 25 -- United States Patent no. 12,341,112, issued on June 24, was assigned to Micron Technology Inc. (Boise, Idaho).

"Semiconductor devices comprising steps" was invented by Rohit Kothari (Boise, Idaho), Adam L. Olson (Boise, Idaho), John D. Hopkins (Meridian, Idaho) and Jeslin J. Wu (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a semiconductor device comprising forming a patterned resist over a stack comprising at least one material and removing a portion of the stack exposed through the patterned resist to form a stack opening. A portion of the patterned resist is laterally removed to form a trimmed resist and an additional portion of the stack expos...