ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,599, issued on June 10, was assigned to Micron Technology Inc. (Boise, Idaho).
"Method of forming photonics structures" was invented by Gurtej Sandhu (Boise, Idaho).
According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosed embodiments relate to an integrated circuit structure and methods of forming them in which photonic devices are formed on the back end of fabricating a CMOS semiconductor structure containing electronic devices. Doped regions associated with the photonic devices are formed using microwave annealing for dopant activation."
The patent was filed on Jan. 2, 2024, under Application No. 18/402,575.
*For further information, includin...