US Patent Issued to Micron Technology on July 29 for "Methods of forming nanostructures utilizing self-assembled nucleic acids" (Idaho Inventor)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,547, issued on July 29, was assigned to Micron Technology Inc. (Boise, Idaho).

"Methods of forming nanostructures utilizing self-assembled nucleic acids" was invented by Gurtej S. Sandhu (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a structure comprises forming a pattern of self-assembled nucleic acids over a material. The pattern of self-assembled nucleic acids is exposed to at least one repair enzyme to repair defects in the pattern. The repaired pattern of self-assembled nucleic acids is transferred to the material to form features therein. A method of decreasing defect density in self-assembled nucleic acids i...