US Patent Issued to Micron Technology on Feb. 10 for "Reticle constructions and photo-processing methods" (Idaho, California Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,547,066, issued on Feb. 10, was assigned to Micron Technology Inc. (Boise, Idaho).

"Reticle constructions and photo-processing methods" was invented by Chung-Yi Lee (Boise, Idaho) and Reha M. Bafrali (Mountain View, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments include a reticle which includes first pattern features and second pattern features. A first optimal dose of actinic radiation is associated with the first pattern features and a second optimal dose of the actinic radiation is associated with the second pattern features. The second pattern features are larger than the first pattern features. Each of the second pattern fea...