US Patent Issued to Micron Technology on Dec. 9 for "Microelectronic devices with improved alignment for contact structures" (Idaho Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,398, issued on Dec. 9, was assigned to Micron Technology Inc. (Boise, Idaho).

"Microelectronic devices with improved alignment for contact structures" was invented by Yi Hu (Boise, Idaho) and Kar Wui Thong (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A microelectronic device comprises a stack structure comprising alternating conductive structures and insulative structures arranged in tiers, each of the tiers individually comprising a conductive structure and an insulative structure, strings of memory cells vertically extending through the stack structure, the strings of memory cells comprising a channel material vertically extending t...