US Patent Issued to Micron Technology on Aug. 26 for "Methods of forming nanostructures including metal oxides using block copolymer materials" (Idaho Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,856, issued on Aug. 26, was assigned to Micron Technology Inc. (Boise, Idaho).

"Methods of forming nanostructures including metal oxides using block copolymer materials" was invented by Nicholas Hendricks (Boise, Idaho), Adam L. Olson (Boise, Idaho), William R. Brown (Boise, Idaho), Ho Seop Eom (Boise, Idaho), Xue Chen (Boise, Idaho), Kaveri Jain (Boise, Idaho) and Scott Schuldenfrei (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A self-assembled nanostructure comprises first domains and second domains. The first domains comprise a first block of a block copolymer material and an activatable catalyst. The second domains comprise a seco...