US Patent Issued to MICRO-EPSILON MESSTECHNIK on Dec. 30 for "Method and system for optically measuring an object having a specular and/or partially specular surface and corresponding measuring arrangement" (German Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,352, issued on Dec. 30, was assigned to MICRO-EPSILON MESSTECHNIK GMBH & Co. KG (Ortenburg, Germany).

"Method and system for optically measuring an object having a specular and/or partially specular surface and corresponding measuring arrangement" was invented by Reiner Kickingereder (Ortenburg, Germany), Alexander Zimmermann (Aholming, Germany), Christian Faber (Ergolding, Germany) and Hanning Liang (Erlangen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a method for optically measuring an object having a reflective and/or partially reflective surface. According to the invention, by means of a pattern generator (1...