ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,264, issued on Dec. 9, was assigned to Meta Platforms Technologies LLC (Menlo Park, Calif.).
"Method for birefringence patterning" was invented by Junren Wang (Kirkland, Wash.), Xiayu Feng (Kirkland, Wash.), Mengfei Wang (Woodinville, Wash.) and Lu Lu (Kirkland, Wash.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes providing a radiation with a predetermined intensity profile. The method also includes providing a photo-sensitive medium layer including a mixture of a photo-sensitive material and an absorbing additive. The absorbing additive has a predetermined non-uniform distribution in at least one of a direction within a film plane ...