US Patent Issued to MERCK PATENT on May 13 for "Compounds and methods for selectively forming metal-containing films" (Massachusetts, Wisconsin Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,537, issued on May 13, was assigned to MERCK PATENT GMBH (Darmstadt, Germany).

"Compounds and methods for selectively forming metal-containing films" was invented by Charith Nanayakkara (Haverhill, Mass.), Joby Eldo (Andover, Mass.), Jacob Woodruff (Lexington, Mass.), Charles Dezelah (Haverhill, Mass.), Shawn Sungeun Hong (Westford, Mass.), Ravindra Kanjolia (North Andover, Mass.), Daniel Moser (Sheboygan Falls, Wis.) and Mark C. Potyen (Sheboygan Falls, Wis.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Compounds for selectively forming metal-containing films are provided. Methods of forming metal-containing films are also provided. The methods in...