US Patent Issued to Merck Patent on July 15 for "PAG-free positive chemically amplified resist composition and methods of using the same" (New Jersey Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,453, issued on July 15, was assigned to Merck Patent GmbH (Darmstadt, Germany).

"PAG-free positive chemically amplified resist composition and methods of using the same" was invented by Takanori Kudo (Bedminster, N.J.) and Hung-Yang Chen (Somerset, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition which has as components a phenolic resin component, a photoactive 2,1,5-diazonaphthoquinonesulfonate component (PAC), a solvent component and that does not contain a photo acid generator (PAG). The PAC is a free PAC, a coupled PAC (PACb) or a combination thereof that includes a substituted or unsubstituted 2,1,5-DNQ material or compo...