ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,714, issued on Jan. 13, was assigned to Merck Patent GmbH (Darmstadt, Germany).
"Polysiloxane composition" was invented by Kensuke Aida (Kakegawa, Japan), Atsuhiko Sato (Kakegawa, Japan), Rikio Kozaki (Kakegawa, Japan) and Kazuya Arima (Kakegawa, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "To provide a polysiloxane composition capable of suppressing the generation of voids when forming a siliceous film. A polysiloxane composition comprising a polysiloxane; a dicarboxylic acid having the first acid dissociation constant pKa1 of 4.0 or less and represented by the following formula (II): HOOC-L-COOH (II) (wherein, L is a single bond, a hydroxy...