US Patent Issued to Merck Patent on Aug. 19 for "Silicon-containing film forming composition and method for manufacturing silicon-containing film using the same" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,391,558, issued on Aug. 19, was assigned to Merck Patent GmbH (Darmstadt, Germany).

"Silicon-containing film forming composition and method for manufacturing silicon-containing film using the same" was invented by Naoko Nakamoto (Kakegawa, Japan), Hideyuki Takagishi (Kakegawa, Japan), Takashi Fujiwara (Kakegawa, Japan) and Atsuhiko Sato (Kakegawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "[Problem] According to the present invention, a silicon-containing film forming composition having a high affinity for a substrate can be provided. [Means for Solution] A silicon-containing film forming composition comprising (I) a polymer having a polysilan...