ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,393,115, issued on Aug. 19, was assigned to Merck Patent GmbH (Darmstadt, Germany).
"Positive working photosensitive material" was invented by Weihong Liu (Branchburg, N.J.), PingHung Lu (Bridgewater, N.J.) and Chunwei Chen (Whitehouse Station, N.J.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein is a photosensitive composition comprising a) at least one photoacid generator; b) at least one Novolak polymer; c) at least one acrylate polymer, comprising a component having structure (I); d) at least one glycidyl hydroxy benzoic acid condensate material comprising one or more compounds having structure (II); e) at least one heterocyclic thio...