US Patent Issued to Merck Patent, Sigma-Aldrich, Versum Materials US on Dec. 23 for "Methods of using high-purity alkynes for selective deposition" (Wisconsin, California, Pennsylvania, Arizona Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,503,760, issued on Dec. 23, was assigned to Merck Patent GmbH (Darmstadt, Germany), Sigma-Aldrich Co. LLC (St. Louis) and Versum Materials US LLC (Tempe, Ariz.).

"Methods of using high-purity alkynes for selective deposition" was invented by Christopher R. Clough (Plymouth, Wis.), Christopher Jay Thode (Adell, Wis.), Christopher David Hopkins (Carlsbad, Calif.), Sergei V. Ivanov (Schnecksville, Pa.) and Agnes Derecskei (Fountain Hills, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of using high-purity alkynes substantially free of residual alkyl halides, water and/or carboxylic acids and their use (e.g., in formulations) for enhanced pass...