ALEXANDRIA, Va., July 16 -- United States Patent no. 12,358,784, issued on July 15, was assigned to MEMSSTAR Ltd. (Lothian, Great Britain).
"Method of manufacturing a microstructure" was invented by Anthony O'Hara (Lothian, Great Britain).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a method of producing a microstructure that comprises employing a hydrogen fluoride (HF) vapour to etch a sacrificial layer of silicon dioxide (SiO2) and thereafter removing a residual layer formed when HF vapour etching the layer of silicon dioxide. The residual layer may comprise silicon, ammonium salt or carbon and various techniques are disclosed for removing such layers. These techniques may be applied con...