US Patent Issued to MELEXIS TECHNOLOGIES on May 20 for "Conformal deposition for high voltage isolation" (Belgian Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,212, issued on May 20, was assigned to MELEXIS TECHNOLOGIES SA (Bevaix, Switzerland).

"Conformal deposition for high voltage isolation" was invented by Brecht Put (Tessenderlo, Belgium) and Tim Vangerven (Tessenderlo, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacture of a sensor and a sensor for sensing a magnetic field generated by a current in a conductive substrate includes a first substrate having a sensing element for sensing magnetic field, and a second substrate is the conductive substrate. A conformal layer is provided by atomic layer deposition between the first substrate and the second substrate, thus protectin...