US Patent Issued to MELEXIS TECHNOLOGIES on April 29 for "Semiconductor device with integrated magnetic flux concentrator, and method for producing same" (Swiss, Belgian Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,290,006, issued on April 29, was assigned to MELEXIS TECHNOLOGIES SA (Bevaix, Switzerland).

"Semiconductor device with integrated magnetic flux concentrator, and method for producing same" was invented by Appo Van Der Wiel (Tessenderlo, Belgium), Yves Bidaux (Bevaix, Switzerland) and Lionel Tombez (Bevaix, Switzerland).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of producing a semiconductor substrate comprising at least one integrated magnetic flux concentrator, comprising the steps of: a) providing a semiconductor substrate having an upper surface; b) making at least one cavity in said upper surface; c) depositing one or more layers of one or...