US Patent Issued to MediaTek Singapore on Jan. 28 for "Semiconductor devices having a resistor structure with more refined coupling effect for improved linearity of resistance" (Singaporean Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,887, issued on Jan. 28, was assigned to MediaTek Singapore Pte. Ltd. (Singapore).

"Semiconductor devices having a resistor structure with more refined coupling effect for improved linearity of resistance" was invented by Lanxiang Wang (Singapore) and Zhigang Duan (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a first terminal, a second terminal positioned away from the first terminal, a first resistive segment coupled between the first terminal and the second terminal, a third terminal positioned away from the first terminal and the second terminal, a second resistive segment coupled between the second term...