ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,878, issued on Nov. 25, was assigned to MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V. (Munich).

"Method and illumination apparatus of adaptive optics in reflection microscopy" was invented by Johannes Dominik Seelig (Bonn, Germany) and Ivan Vishniakou (Bonn, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for optimizing parameters of a physical light propagation model. The method includes making available a physical model of a light propagation in an optical system, radiating an input-light distribution into an excitation path of the optical system using an illumination unit, passing the input light distribution thro...