US Patent Issued to MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN on Feb. 18 for "Method and illumination apparatus of the adaptive optics in reflection microscopy" (German Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,229,674, issued on Feb. 18, was assigned to MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V. (Munich).

"Method and illumination apparatus of the adaptive optics in reflection microscopy" was invented by Johannes Dominik Seelig (Bonn, Germany) and Ivan Vishniakou (Bonn, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for training a mathematical model which describes a light propagation in a reflection microscopy includes radiating a light distribution I0 into an excitation path of a microscope, modulating the light distribution I0 to form a light distribution IA in the excitation path via an optical modulator, reflecting the...