ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,509,763, issued on Dec. 30, was assigned to MATSUDA SANGYO COMPANY Ltd. (Tokyo).
"Noble metal vapor deposition material" was invented by Takahiro Kobayashi (Saitama, Japan) and Atsushi Kawashimo (Saitama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present disclosure is to provide a noble metal vapor deposition material for use in a vacuum vapor deposition method capable of suppressing the occurrence of the bumping phenomenon during vacuum vapor deposition. Provided is a vapor deposition material composed of a noble metal, wherein, when a surface area of 50 micro metrex50 micro metre of the vapor deposition material is analyzed...