US Patent Issued to Materion on July 1 for "Photo resist as opaque aperture mask on multispectral filter arrays" (Massachusetts Inventor)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,345,903, issued on July 1, was assigned to Materion Corp. (Mayfield Heights, Ohio).

"Photo resist as opaque aperture mask on multispectral filter arrays" was invented by Kevin R. Downing (Westford, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus (e.g., a multi-spectral optical filter array, an optical wafer, an optical component) has an aperture mask printed directly thereon, the aperture mask including a positive or negative photoresist. The apparatus includes a substrate having the aperture mask printed on at least one of a light entrance surface or a light exit surface of the substrate so as to provide an aperture over a portion of t...