US Patent Issued to Lutronic on Dec. 2 for "RF microneedle system with enhanced cooling" (South Korean, American Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,484,953, issued on Dec. 2, was assigned to Lutronic Corp. (Gyeonggi-do, South Korea).

"RF microneedle system with enhanced cooling" was invented by James Bartholomeusz (Beverly Hills, Calif.) and Jaesung Kim (Gyeunggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An RF microneedle system is provided with a cooling duct that at least partially surrounds a circumference of a microneedle housing. Depending upon how much circumference is surrounded by the nozzle determines the cooling coverage. For example, if the nozzle surrounds the entire circumference, 360 degrees of cooling coverage is provided. In addition, the nozzle is configured to ...