US Patent Issued to Lumileds Singapore on Sept. 2 for "Patterned deposition mask formed using polymer dispersed in a liquid solvent" (German Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,408,496, issued on Sept. 2, was assigned to Lumileds Singapore Pte. Ltd. (Singapore).

"Patterned deposition mask formed using polymer dispersed in a liquid solvent" was invented by Jens Meyer (Cologne, Germany), Marinus Johannes Petrus Maria van Gerwen (Aachen, Germany) and Ronja Missong (Aachen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polymer dispersion layer is formed on a substrate or semiconductor light-emitting devices on the substrate. After forming the polymer dispersion layer, drying and curing the polymer dispersion layer forms a cured polymer layer. After curing and drying, with the cured polymer layer being present on only se...