ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,561, issued on June 17, was assigned to Lumentum Operations LLC (San Jose, Calif.).

"Emitter oxidation uniformity within a wafer" was invented by Benjamin Kesler (Sunnyvale, Calif.), Ajit Vijay Barve (San Jose, Calif.) and Guowei Zhao (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer may comprise a substrate layer and a plurality of vertical cavity surface emitting lasers (VCSELs) formed on or within the substrate layer. A respective trench-to-trench distance associated with the plurality of VCSELs may vary across the wafer based on a predicted variation of an oxidation rate of an oxidation layer across the wafer."

The patent...