US Patent Issued to LPE S.P.A, DENSO on June 17 for "Reaction chamber for a deposition reactor with interspace and lower closing element and reactor" (Italian, Japanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,331,423, issued on June 17, was assigned to LPE S.P.A (Baranzate, Italy) and DENSO Corp. (Aichi-Pref, Japan).

"Reaction chamber for a deposition reactor with interspace and lower closing element and reactor" was invented by Francesco Corea (Baranzate, Italy), Danilo Crippa (Baranzate, Italy), Maurilio Meschia (Baranzate, Italy), Silvio Preti (Baranzate, Italy) and Yuichiro Tokuda (Aichi-Pref, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The reaction chamber (100) is used for a deposition reactor of layers of semiconductor material on substrates; it comprises a tube (110) made of quartz and having a cylindrical shape and adapted to be positioned ...