US Patent Issued to LPE on Oct. 7 for "Reaction chamber for an epitaxial reactor of semiconductor material with non-uniform longitudinal section and reactor" (Italian Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,420, issued on Oct. 7, was assigned to LPE S.P.A. (Baranzate, Italy).

"Reaction chamber for an epitaxial reactor of semiconductor material with non-uniform longitudinal section and reactor" was invented by Silvio Preti (Baranzate, Italy), Francesco Corea (Baranzate, Italy) and Maurilio Meschia (Baranzate, Italy).

According to the abstract* released by the U.S. Patent & Trademark Office: "The reaction chamber (100A) is used for a reactor for the deposition of semiconductor material on a substrate (62); it extends in a longitudinal direction and comprises a reaction and deposition zone (10) which extends in the longitudinal direction; this zone (10) is defined by susceptor elements ...