US Patent Issued to LPE, DENSO on July 29 for "Reaction chamber comprising a rotating element for the deposition of a semiconductor material" (Italian, Japanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,371,779, issued on July 29, was assigned to LPE S.P.A. (Baranzate, Italy) and DENSO Corp. (Aichi-Pref, Japan).

"Reaction chamber comprising a rotating element for the deposition of a semiconductor material" was invented by Francesco Corea (Baranzate, Italy), Danilo Crippa (Baranzate, Italy), Maurilio Meschia (Baranzate, Italy) and Yuichiro Tokuda (Aichi-Pref, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The reaction chamber (100) is designed for a reactor (100) for deposition of layers of semiconductor material on substrates; it comprises a tube (110) and an injector (20) and a holder (30); the tube (110) is made of quartz and has a cylindrical ...