US Patent Issued to LOT CES, LOT VACUUM on June 10 for "Plasma reactor for inductively coupled plasma and method of assembling the same" (South Korean Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,713, issued on June 10, was assigned to LOT CES Co. LTD. (Osan-si, South Korea) and LOT VACUUM Co. LTD. (Osan-si, South Korea).

"Plasma reactor for inductively coupled plasma and method of assembling the same" was invented by Jin Ho Bae (Hwaseong-si, South Korea), Min Jae Kim (Ansan-si, South Korea), Geon Bo Sim (Osan-si, South Korea) and Tae Wook Yoo (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma reactor for inductively coupled plasma includes: a ferrite core assembly including a ferrite core stacked body including a plurality of ferrite cores stacked and a first passage portion and a second passage portion arranged in ...