ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,408,870, issued on Sept. 9, was assigned to LG Electronics Inc. (Seoul, South Korea).

"Mask apparatus and method for controlling the same" was invented by Sooyong Park (Seoul, South Korea), Jinmoo Park (Seoul, South Korea), Seonghun Lee (Seoul, South Korea), Junchan Kwon (Seoul, South Korea) and Minsoo Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method for controlling a mask apparatus. The method for controlling the mask apparatus includes measuring a current pressure value with respect to a mask by using a pressure sensor, comparing each of a preset atmospheric pressure maximum estimation and a preset and a pre...