ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,453,872, issued on Oct. 28, was assigned to LG Electronics Inc. (Seoul, South Korea).
"Mask apparatus with filtered rear fan inlet" was invented by Yongmin Song (Seoul, South Korea), Dongkwon An (Seoul, South Korea), Yeongcheol Mun (Seoul, South Korea), Dongeun Kim (Seoul, South Korea) and Sejeong Ahn (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask apparatus includes: a mask body including a rear body and a front body coupled to a front surface of the rear body and providing an inlet and an outlet, a face guard coupled to the rear body, accommodating a user's face, and defining a respiration space, and an air cleaning module pu...