ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,508,451, issued on Dec. 30, was assigned to LG Electronics Inc. (Seoul, South Korea).

"Mask apparatus with rear surface inlet and outlet" was invented by Chiyoung Choi (Seoul, South Korea), Hojung Kim (Seoul, South Korea), Hyungho Park (Seoul, South Korea), Yongmin Kim (Seoul, South Korea) and Sejin Choi (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask apparatus includes: a mask body including a rear body and a front body coupled to a front surface of the rear body and providing an inlet and an outlet, a face guard coupled to the rear body, accommodating a portion of user's face, and defining a respiration space, and an air clea...