ALEXANDRIA, Va., June 6 -- United States Patent no. 12,284,746, issued on April 22, was assigned to LG Electronics Inc. (Seoul, South Korea).
"Thermal plasma processing apparatus" was invented by Hyunwoo Park (Seoul, South Korea), Wooil Kim (Seoul, South Korea), Gyegwang Lee (Seoul, South Korea) and Imjun Cho (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a thermal plasma processing apparatus capable of efficiently using thermal plasma and securing a reaction time for the thermal decomposition of the processing gas. A Thermal plasma processing apparatus according to an embodiment of the present disclosure includes a torch part in which an arc is generated...