ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,164, issued on Oct. 7, was assigned to LG CHEM Ltd. (Seoul, South Korea).
"Photocurable composition, coating layer comprising cured product thereof, and substrate for semiconductor process" was invented by Sang Hwan Kim (Daejeon, South Korea), Jung Woo Choi (Daejeon, South Korea), Ki Seung Seo (Daejeon, South Korea), Kwang Su Seo (Daejeon, South Korea), Jun Beom Park (Daejeon, South Korea) and Won Seup Cho (Daejeon, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a photocurable composition, which has excellent coatability and is capable of providing a coating layer having excellent surface quality and thickn...