US Patent Issued to LG Chem on Oct. 21 for "Pattern film, method for manufacturing pattern film, and transmittance variable device comprising same" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,449,570, issued on Oct. 21, was assigned to LG Chem Ltd. (Seoul, South Korea).

"Pattern film, method for manufacturing pattern film, and transmittance variable device comprising same" was invented by Cheolock Song (Daejeon, South Korea), Han Min Seo (Daejeon, South Korea), Nam Seok Bae (Daejeon, South Korea), Jiehyun Seong (Daejeon, South Korea), Seung Heon Lee (Daejeon, South Korea) and Minjun Gim (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pattern film, a method for manufacturing a pattern film, and a transmittance variable device comprising the same are disclosed herein. In some embodiments, a pattern film includes a base l...