US Patent Issued to LG CHEM on Jan. 13 for "Polyamide-imide block copolymers, preparation method thereof and polyamide-imide film comprising the same" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,729, issued on Jan. 13, was assigned to LG CHEM Ltd. (Seoul, South Korea).

"Polyamide-imide block copolymers, preparation method thereof and polyamide-imide film comprising the same" was invented by Gieun Park (Daejeon, South Korea), Jae Gu Lim (Daejeon, South Korea), Yoon Bin Lim (Daejeon, South Korea), Tae Seob Lee (Daejeon, South Korea), Seung Joon Lim (Daejeon, South Korea), Se Jeong Kim (Daejeon, South Korea) and Woo Han Kim (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The polyamide-imide block copolymer according to the present invention makes it possible to provide a polyamide-imide film having excellent thermal stabil...