US Patent Issued to LG Chem on Dec. 16 for "Carboxylic acid-modified nitrile-based copolymer latex composition, latex composition for dip molding including the same, and molded article therefrom" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,501, issued on Dec. 16, was assigned to LG Chem Ltd. (Seoul, South Korea).

"Carboxylic acid-modified nitrile-based copolymer latex composition, latex composition for dip molding including the same, and molded article therefrom" was invented by Jung Eun Kim (Daejeon, South Korea), Ji Hyun Kim (Daejeon, South Korea) and Seung Uk Yeu (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a carboxylic acid-modified nitrile-based copolymer latex composition, and more particularly, a carboxylic acid-modified nitrile-based copolymer latex composition including a carboxylic acid-modified nitrile-based copolymer. The carboxylic acid...