ALEXANDRIA, Va., June 4 -- United States Patent no. 12,321,006, issued on June 3, was assigned to LEIA SPV LLC (Menlo Park, Calif.).
"Diffractive backlight fabrication method" was invented by Thomas Hoekman (Menlo Park, Calif.), David A. Fattal (Menlo Park, Calif.), Ming Ma (Menlo Park, Calif.) and Zhen Peng (Menlo Park, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Diffractive backlight fabrication employs a diffraction grating to scatter light from a light guide and define a reflective island that is aligned with the diffraction grating. A method of fabricating a diffractive backlight includes providing the light guide having the diffraction grating, diffractively scattering guided light out of the...