US Patent Issued to Lehigh University on Nov. 18 for "High pressure spatial chemical vapor deposition system and related process" (Pennsylvania Inventor)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,473,642, issued on Nov. 18, was assigned to Lehigh University (Bethlehem, Pa.).

"High pressure spatial chemical vapor deposition system and related process" was invented by Siddha Pimputkar (Bethlehem, Pa.).

According to the abstract* released by the U.S. Patent & Trademark Office: "High pressure spatial chemical vapor deposition apparatuses and related process are disclosed for forming thin films on a substrate. An enclosure includes plural process chambers fluidly isolated from each other by radial separating barriers. Each chamber contains a different source gas comprising volatile reactive species. The substrate is supported beneath the chambers on a rotating heated susceptor. Ro...