ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,466,919, issued on Nov. 11, was assigned to LCY CHEMICAL CORP. (Kaohsiung, Taiwan).
"Polyamic acid, polyimide, and element formed therefrom" was invented by Chuan-Jen Fu (Kaohsiung, Taiwan), Shih-Wei Lee (Kaohsiung, Taiwan), Hsiao-Chu Lin (Kaohsiung, Taiwan), Shu-Mei Yang (Kaohsiung, Taiwan), Shih-Hung Huang (Kaohsiung, Taiwan) and Tzu-Yuan Shih (Kaohsiung, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A polyimide is provided, which contains at least one repeating unit selected from a group consisting of the following general formulas, M, N, and O):X is a residue derived from TCA represented by formula I. Y1 is a residue derived from a diamine w...