ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,420,477, issued on Sept. 23, was assigned to Lawrence Livermore National Security LLC (Livermore, Calif.).
"Large area projection micro stereolithography" was invented by Bryan D. Moran (Pleasanton, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A large area projection micro stereolithography (LAPMuSL) system uses an addressable spatial light modulator (SLM) in coordination with an optical scanning system to make very large stereolithographically produced objects. The SLM is imaged onto a photosensitive material with an optical system that has the ability to scan the image over a large area and speedily manufacture large scale complex three dime...