ALEXANDRIA, Va., March 12 -- United States Patent no. 12,247,829, issued on March 11, was assigned to LAWRENCE LIVERMORE NATIONAL SECURITY LLC (Livermore, Calif.).
"Optimal parameter selection for structured light metrology" was invented by Brian Giera (Oakland, Calif.), Adam Jaycox (Broomfield, Calif.), Brian Au (El Mont, Calif.), Alex Caviness (Oakland, Calif.), Alexander Blum (Livermore, Calif.) and Nishant Ojal (Livermore, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method is disclosed for selecting an optimal value for an adjustable parameter of a structured light metrology (SLM) system, for scanning an object. The SLM system performs test scans of the object to acquire a plurality of sets o...