US Patent Issued to Lawrence Livermore National Security on Jan. 28 for "System and method for submicron additive manufacturing" (American, Chinese Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,208,569, issued on Jan. 28, was assigned to Lawrence Livermore National Security LLC (Livermore, Calif.).

"System and method for submicron additive manufacturing" was invented by Sourabh Kumar Saha (Livermore, Calif.), Robert Matthew Panas (Dublin, Calif.) and Shih-Chi Chen (Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a method for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. A laser beam is directed at a tunable mask. At least one emergent beam is collected from a plurality of emergent beams emerging from the tunable mask. The at least one ...