ALEXANDRIA, Va., June 19 -- United States Patent no. 12,330,102, issued on June 17, was assigned to LAM RESEARH Corp. (Fremont, Calif.).
"Filter for a plasma plume" was invented by Jan Matthijn Dekkers (Aadorp, Netherlands), Kristiaan Hendrikus Aloysius Bohm (Deventer, Netherlands), Willem Cornelis Lambert Hopman (Deventer, Netherlands), Jeroen Aaldert Heuver (Enschede, Netherlands) and Jan Arnaud Janssens (Schalkhaar, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A filter for a pulsed laser deposition device includes a housing with two pass-through openings arranged in the housing wall and forming a pass-through channel for passing at least part of the plasma plume through the housing, which pa...