ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,902, issued on Sept. 16, was assigned to Lam Research Corp. (Fremont, Calif.).
"Method for cleaning a chamber" was invented by Ran Lin (Fremont, Calif.), Wenbing Yang (Campbell, Calif.), Tamal Mukherjee (Fremont, Calif.), Jengyi Yu (San Ramon, Calif.), Samantha Siamhwa Tan (Newark, Calif.), Yang Pan (Los Altos, Calif.) and Yiwen Fan (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for cleaning a plasma processing chamber comprising one or more cycles is provided. Each cycle comprises performing an oxygen containing plasma cleaning phase, performing a volatile chemistry type residue cleaning phase, and performing a fluorine c...