US Patent Issued to Lam Research on Oct. 7 for "Pre-exposure photoresist curing to enhance EUV lithographic performance" (California Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,464, issued on Oct. 7, was assigned to Lam Research Corp. (Fremont, Calif.).

"Pre-exposure photoresist curing to enhance EUV lithographic performance" was invented by Timothy William Weidman (Sunnyvale, Calif.), Kevin Li Gu (Mountain View, Calif.), Chenghao Wu (San Jose, Calif.), Katie Lynn Nardi (San Jose, Calif.) and Boris Volosskiy (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are methods and apparatuses for exposing an organic metal-oxide film to a blanket UV treatment prior to a lithographic patterning operation. A blanket UV treatment may be used to shift a solubility curve of the film, such that a lower EUV ...