US Patent Issued to LAM RESEARCH on Oct. 21 for "Atomic layer treatment process using metastable activated radical species" (California Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,332, issued on Oct. 21, was assigned to LAM RESEARCH Corp. (Fremont, Calif.).

"Atomic layer treatment process using metastable activated radical species" was invented by Xinyu Bao (Fremont, Calif.) and Haoquan Fang (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for treating an exposed surface of a substrate includes purging first and second chambers of a substrate processing system using a purge gas. A gas distribution device is arranged between the first chamber and the second chamber. The method includes flowing a treatment gas to the second chamber but not the first chamber to create an adsorption layer on a surface of...