ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,147, issued on Nov. 11, was assigned to LAM RESEARCH Corp. (Fremont, Calif.).
"Vapor cleaning of substrate surfaces" was invented by David Mui (Fremont, Calif.), Gerome Michel Dominique Melaet (San Leandro, Calif.), Nathan Musselwhite (San Jose, Calif.), Michael Ravkin (Los Altos, Calif.), Mark Kawaguchi (San Carlos, Calif.) and Ilia Kalinovski (Berkeley, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for cleaning a substrate includes arranging the substrate in a processing chamber; controlling a pressure of the processing chamber to a predetermined pressure range; controlling a temperature of the processing chamber to a predetermine...