ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,130, issued on Nov. 11, was assigned to LAM RESEARCH Corp. (Fremont, Calif.).
"Temperature-tuned substrate support for substrate processing systems" was invented by Norman A. Mertke (San Jose, Calif.) and Himanshu Chokshi (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A system for controlling a temperature of a substrate during treatment in a substrate processing system comprises a substrate support including first and second components, first and second heaters, and first and second heat sinks. The first component includes an upper surface at least partially defining a center zone. The second component is arranged radially outside ...