US Patent Issued to Lam Research on May 20 for "Mechanical suppression of parasitic plasma in substrate processing chamber" (Oregon Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,308,216, issued on May 20, was assigned to Lam Research Corp. (Fremont, Calif.).

"Mechanical suppression of parasitic plasma in substrate processing chamber" was invented by Douglas Keil (West Linn, Ore.), Edward J. Augustyniak (Tualatin, Ore.), Karl Frederick Leeser (West Linn, Ore.) and Mohamed Sabri (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system includes an electrode. The electrode includes a showerhead having a first stem portion and a head portion. A plurality of dielectric layers is vertically stacked between the electrode and a first surface of a conducting structure. The plurality of dielectric layers includes M dielect...